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IMEC CMOS and can accept the evaluation result of company A’s equipment. From a device manufacturer’s viewpoint, this means that the equipment manufacturer obtains the evaluation results of reliable devices, and it saves the device manufacturers from doing the evaluation work from scratch by themselves. That is, they can quickly absorb the equipment and material manufacturer’s wisdom. Similarly, device manufacturers can secure their own lab area in IMEC and develop their unique devices by using the IMEC pilot line.

At IMEC, device, equipment, and material manufacturers can exchange their information while protecting their own differentiating technology secrets through adequate theme selection and organization management. There is no need for device manufacturers to enclose equipment and material manufacturers to assimilate knowledge from them. Instead, they can quickly get the results of development by equipment and material manufacturers.

CONCLUSION

With increase in the transistor density on a chip, the minimizing pattern size has become smaller and interaction between unit processes has become more complex. To obtain the smaller pattern size with minimizing the undesirable influences of the process interaction, after the era of 1MDRAM, deep understanding of the physical-chemical phenomena in each unit process and the physical-chemical properties of materials has come to be needed. In other words, to develop an effective new process, and to select an appropriate new material, researchers came to have to consider the interactions. In the Japanese consortia newly started, however, it is so difficult for researchers of consortia to get the necessary information for solving the interaction problems because of sectionalized organization. If Japanese chip suppliers want to keep development capability of unit processes with minimum research cost, they need to focus the key process to standardize other processes among the consortia members. A consortium should be established to develop the technologies that agree all members' making them to the standard among members. Before starting the new consortium, members have to characterize the technology.

REFERENCES

Chuma, Hiroyuki. 2006. "Increasing Complexity and Limits of Organization in the Microlithography Industry: Implications for Science-based Industries." Research Policy 35:394-411.

Chuma, Hiroyuki, and Norikazu Hashimoto. 2007. "Moore's Law, Increasing Complexity and Limits of Organization: Modern Significance of Japanese DRAM ERA." NISTEP Discussion Paper No. 44. Tokyo, Japan: National Institute of Science and Technology Policy.

Fujimura, Shuzo. 2000. “Handotai Rikkoku Futatabi.” (In Japanese.) Nikkann-Kogyo Shin-bun-sha.

Mooris, P. R. 1990. A History of the World Semiconductor Industry. Stevenage, UK: Peter Peregrinus Ltd.



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