• develop a strategic plan for this facility to address the nanofabrication-related metrology needs and fabrication capabilities of greatest impact on nanomanufacturing in key areas of national economic importance. The CNST should also consider expanding the NanoFab mission to include process-specific developments in nanofabrication and to encourage NanoFab staff members to publish papers related to processing topics.

  • The CNST should further diversify the user base for the NanoFab. The capabilities are so outstanding that they would be in greater demand if more potential users knew about them.
  • Intellectual property (IP) protection of CNST developments was not emphasized in the CNST technical presentations overall. The CNST should pursue IP protection where appropriate. Specifically, some processing accomplishments in the NanoFab facility are of sufficient merit to warrant IP discussions—for example, (1) deep reactive-ion etch wall process control and (2) uniformity of reactive-ion etch processing with differential pattern loading on a wafer.

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