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PAPERBACK price:$30.75 add to cart Rights & Permissions Free PDF Access Sign in to download PDF book and chapters Free Resources Display this book on your site! Related Titles Plasma Science:From Fundamental Research to Technological Applications Plasma Processing and Processing Science Other Related Titles Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (1991) Commission on Physical Sciences, Mathematics, and Applications (CPSMA) Citation Manager Export the bibliographic data for this book in your chosen format Web Search Builder Use this book's key terms to search within this book, across our collection, or across the Web. Skim This Chapter Skim this chapter and use this chapter's key terms to search within this book. Reference Finder Paste in your own text to find books that relate to your topic. Citation Manager . "APPENDIX: PARTICIPANTS IN WORKSHOP ON PLASMA PROCESSING OF MATERIALS." Plasma Processing of Materials: Scientific Opportunities and Technological Challenges. Washington, DC: The National Academies Press, 1991. Please select a format: Page 75   E-mail Share on facebook Facebook Share on delicious Delicious Share on stumbleupon Stumble Share on twitter Twitter More Sharing ServicesMore The following HTML text is provided to enhance online readability. Many aspects of typography translate only awkwardly to HTML. Please use the page image as the authoritative form to ensure accuracy. Appendix Participants in Workshop on Plasma Processing of Materials J. Norman Bardsley, Lawrence Livermore National Laboratory Kurt Becker, The City College of New York David Benenson, State University of New York at Buffalo Richard Buss, Sandia National Laboratories Hugh Casey, Los Alamos National Laboratory Philip Cosby, SRI International Thomas Eddy, EG&G Idaho, Inc., INEL Douglas W. Ernie, University of Minnesota David Fraser, Intel Valery Godyak, GTE Laboratories Inc. John Herron, National Institute of Standards and Technology Dale Ibbotson, AT&T Bell Laboratories Peter Kong, EG&G Idaho, Inc., INEL Charles Kruger, Jr., Stanford University Vincent McCoy, California Institute of Technology Bob McGrath, Sandia National Laboratories P. A. Miller, Sandia National Laboratories John Mucha, AT&T Bell Laboratories Jerry Perrizo, Air Force Office of Scientific Research Charles W. Roberson, Office of Naval Research James Roberts, National Institute of Standards and Technology Leon Shohet, University of Wisconsin Mark Smith, Sandia National Laboratories Iran Thomas, Department of Energy Amy Wendt, University of Wisconsin Claude Woods, University of Wisconsin Page 75 FRONT MATTER (R1-R12) 1 SUMMARY, FINDINGS, CONCLUSIONS, AND RECOMMENDATIONS (1-5) 2 PLASMA PROCESSING AND LOW-ENERGY PLASMA SCIENCE (6-12) 3 PLASMA PROCESSING IN THE ELECTRONICS INDUSTRY (13-36) 4 SCIENTIFIC FOUNDATION OF PLASMA PROCESSING (37-64) 5 EDUCATIONAL ISSUES (65-74) APPENDIX: PARTICIPANTS IN WORKSHOP ON PLASMA PROCESSING OF MATERIALS (75-76)

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Plasma Processing of Materials: Scientific Opportunities and Technological Challenges Appendix Participants in Workshop on Plasma Processing of Materials J. Norman Bardsley, Lawrence Livermore National Laboratory Kurt Becker, The City College of New York David Benenson, State University of New York at Buffalo Richard Buss, Sandia National Laboratories Hugh Casey, Los Alamos National Laboratory Philip Cosby, SRI International Thomas Eddy, EG&G Idaho, Inc., INEL Douglas W. Ernie, University of Minnesota David Fraser, Intel Valery Godyak, GTE Laboratories Inc. John Herron, National Institute of Standards and Technology Dale Ibbotson, AT&T Bell Laboratories Peter Kong, EG&G Idaho, Inc., INEL Charles Kruger, Jr., Stanford University Vincent McCoy, California Institute of Technology Bob McGrath, Sandia National Laboratories P. A. Miller, Sandia National Laboratories John Mucha, AT&T Bell Laboratories Jerry Perrizo, Air Force Office of Scientific Research Charles W. Roberson, Office of Naval Research James Roberts, National Institute of Standards and Technology Leon Shohet, University of Wisconsin Mark Smith, Sandia National Laboratories Iran Thomas, Department of Energy Amy Wendt, University of Wisconsin Claude Woods, University of Wisconsin

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Plasma Processing of Materials: Scientific Opportunities and Technological Challenges This page in the original is blank.

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