Below are the first 10 and last 10 pages of uncorrected machine-read text (when available) of this chapter, followed by the top 30 algorithmically extracted key phrases from the chapter as a whole.
Intended to provide our own search engines and external engines with highly rich, chapter-representative searchable text on the opening pages of each chapter. Because it is UNCORRECTED material, please consider the following text as a useful but insufficient proxy for the authoritative book pages.
Do not use for reproduction, copying, pasting, or reading; exclusively for search engines.
OCR for page 75
Plasma Processing of Materials: Scientific Opportunities and Technological Challenges Appendix Participants in Workshop on Plasma Processing of Materials J. Norman Bardsley, Lawrence Livermore National Laboratory Kurt Becker, The City College of New York David Benenson, State University of New York at Buffalo Richard Buss, Sandia National Laboratories Hugh Casey, Los Alamos National Laboratory Philip Cosby, SRI International Thomas Eddy, EG&G Idaho, Inc., INEL Douglas W. Ernie, University of Minnesota David Fraser, Intel Valery Godyak, GTE Laboratories Inc. John Herron, National Institute of Standards and Technology Dale Ibbotson, AT&T Bell Laboratories Peter Kong, EG&G Idaho, Inc., INEL Charles Kruger, Jr., Stanford University Vincent McCoy, California Institute of Technology Bob McGrath, Sandia National Laboratories P. A. Miller, Sandia National Laboratories John Mucha, AT&T Bell Laboratories Jerry Perrizo, Air Force Office of Scientific Research Charles W. Roberson, Office of Naval Research James Roberts, National Institute of Standards and Technology Leon Shohet, University of Wisconsin Mark Smith, Sandia National Laboratories Iran Thomas, Department of Energy Amy Wendt, University of Wisconsin Claude Woods, University of Wisconsin
OCR for page 76
Plasma Processing of Materials: Scientific Opportunities and Technological Challenges This page in the original is blank.
Representative terms from entire chapter: