James Moore, Rensselaer Polytechnic Institute

Murugappan Muthukumar, University of Massachusetts

Allen Noshay, Union Carbide Corporation

Alphonsus V. Pocius, 3M

John F. Rabolt, IBM Almaden Research Center

Kenneth L. Reifsnider, Virginia Polytechnic Institute and State University

Thomas P. Russell, IBM Almaden Research Center

Felix Theeuwes, ALZA Corporation

Garth L. Wilkes, Virginia Polytechnic Institute and State University

David J. Williams, Eastman Kodak Company

Gary E. Wnek, Rensselaer Polytechnic Institute

Fred Wudl, University of California at Santa Barbara

Do Y. Yoon, IBM Almaden Research Center

Bruno H. Zimm, University of California at San Diego

R. Stephen Berry, University of Chicago

Paul Calvert, University of Arizona

John G. Curro, Sandia National Laboratory

Alan D. English, E.I. du Pont de Nemours & Co.

Glenn H. Fredrickson, University of California at Santa Barbara

Peter C. Juliano, General Electric Company

Wayne L. Mattice, University of Akron

Robert M. Nowak, Dow Chemical Company

Eli M. Pearce, Polymer Research Institute, Polytechnic University, Brooklyn

Philip Pincus, University of California at Santa Barbara

Hans Pohlmann, Amoco Chemical Corporation

Durward T. Roberts, Bridgestone/Firestone

Ann Salamone, Rochal Industries

Edward T. Samulski, University of North Carolina at Chapel Hill

George Schmeltzer, Miles

Matthew V. Tirrell, University of Minnesota

S. Richard Turner, Eastman Kodak Company

Garth L. Wilkes, Virginia Polytechnic Institute and State University

Tom Wollner, 3M

Hyuk Yu, University of Wisconsin at Madison

Charles E. Browning, Wright Laboratory, Wright-Patterson Air Force Base

Stuart L. Cooper, University of Wisconsin at Madison

Kenneth A. Dill, University of California at San Francisco