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Database Needs for Modeling and Simulation of Plasma Processing (1996)
Commission on Physical Sciences, Mathematics, and Applications (CPSMA)

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. "5 Electron Collision Processes." Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press, 1996.

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The following HTML text is provided to enhance online readability. Many aspects of typography translate only awkwardly to HTML. Please use the page image as the authoritative form to ensure accuracy.

It is entirely feasible to construct an electronic database including sources of data for compounds used in plasma processing and files of the corresponding numerical data. Maintained as an ongoing effort and distributed using modem technologies, such a database would improve the efficiency of efforts to model and simulate plasma reactors.

Findings

Data for electron-neutral collisions are sketchy at best for most species of interest in plasma processing, although some species, such as SiH4 and CF4, have received considerable attention. However, little information is available for dissociation products or for species in excited states. Recent progress in computational methods based on quantum scattering offers the possibility that the costly and time-consuming experiments may be augmented or even replaced by large-scale computation.

References

1. T.R. Hayes, R.D. Wetzel, and R.S. Freund, Phys. Rev. A 35:578 (1987); R.S. Freund, R.C. Wetzel, R.J. Shul, and T.R. Hayes, Phys. Rev. A 41:3575 (1990).

2. V. Tarnovsky, A. Levin, H. Deutsch, and K. Becker, J. Phys. B 29:135-49 (1996); R. Celiberto and T.N. Rescigno, Phys. Rev. A 47:1939 (1993).

3. R. Basher, M. Schmidt, and H. Deutsch, Contrib. Plasma Phys. 35:375-94 (1995); S. McGinnis, K. Riehl, and P.D. Haaland, Chem. Phys. Lett. 232:99 (1995); R. Basner, R. Foest, M. Schmidt, F. Sigeneger, P. Kurunczi, K. Becker, and H. Deutsch, Int. J. Mass Spectrom. Ion Processes 153(1):65 (1996).

4. A. Blanks, A.E. Tabor, and K. Becker, J. Chem. Phys. 86:4871 (1987). P.G. Gilbert, R.B. Siegel, and K. Becker, Phys. Rev. A 41:5594 (1990).

5. T. Nakano, H. Toyoda, and H. Sugai, Jpn. J. Appl. Phys. 30:2908 (1991); T. Nakano, H. Toyoda, and H. Sugai, Jpn. J. Appl. Phys. 30:2912 (1991); M. Ito, M. Goto, H. Toyoda, and H. Sugai, Contrib. Plasma Phys. 35:405 (1995); H. Sugai, H. Toyoda, T. Nakano, and M. Goto, Contrib. Plasma Phys. 35:415 (1995).

6. T.N. Rescigno, Phys. Rev. A 50:1382 (1994); T.N. Rescigno, Phys. Rev. A 51:329 (1995).

7. I. Iga, M.V.V.S. Rao, S.K. Srivastava, and J.C. Nogueira, Z. Phys. D 24:111 (1992).

8. P. Haaland, J. Chem. Phys. 93:4066 (1990).

9. L.G. Christophorou, in Nonequilibrium Processes in Partially Ionized Gases, ed. M. Capitelli and J.N. Bardsley (Plenum Press, New York, 1990).

10. See, for example, E. Beaty, J. Dutton, and L.C. Pitchford, A Bibliography of Electron Swarm Data, JILA Information Center Report No. 20 (December 1979).

11. R. Nagpal and A. Garscadden, "Low-Energy Collision Cross Sections for SiH4," J. Applied Phys. 75:703 (1994).

12. R.A. Bonham, "Electron Impact Cross Section Data for CF4," Jpn. J. Applied Phys. 1 33:4157 (1994).

13. H. Sugai, H. Toyoda, T. Nakano, and M. Goto, Contrib. Plasma Phys. 35:415 (1995).

14. R. Nagpal and A. Garscadden, "Electron Collision Cross Section of Boron Trichloride," Applied Phys. Lett. 64(13):1626 (1994).

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