Appendix B:
Workshop Agenda

Saturday, April 1, 1995

0900

Opening Remarks

David B. Graves and Mark J. Kushner, Co-chairs

0910

ARPA Objectives

Bert Hui, Defense Advanced Research Projects Agency

Session I: Industrial Perspectives

A. Equipment Supplier Perspectives

0925

Modeling: A Design Engine For The U.S. Semiconductor Equipment Industry

Alexander M. Voshchenkov, Lain Research Corporation

1005

Challenges in Design and Manufacturing of Semiconductor Process Equipment

Abe Ghanbari, Materials Research Corporation

1045

Break

 

B. Chip Manufacturer Perspectives

1100

Plasma Processes—A Chipmaker's View

Frederick Dill, IBM T.J. Watson Research Center

1140

Digital Semiconductor's Perspective on Plasma Modeling and Database Needs

Andrew Labun, Digital Equipment Corporation

1215

Lunch

 

Session II: Status And Needs Of Modeling And Simulation

A. Tool Scale Simulation

1315

Glow Discharge Plasma Simulation: Current Status, Needs, and Future Outlook

Demetre J. Economou, University of Houston

1345

Development of Design Oriented Simulation Tools for the Microelectronic Industry

Anantha Krishnan, CFD Research Corporation

B. Feature Scale Simulation

1415

Low Pressure Transport and Reaction in Features

Timothy S. Cale, Arizona State University

1445

Feature Scale Simulation and Model Characterization

Vivek Singh, Intel Corporation

1515

Break

 

Session III: Discussion

1530

Breakout Sessions

Industrial Perspectives

Tool Scale

Feature Scale

 

1630

Break

 

1645

Reports on Breakout Sessions

 

1645

Industrial Perspectives

Andrew Labun



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OCR for page 61
--> Appendix B: Workshop Agenda Saturday, April 1, 1995 0900 Opening Remarks David B. Graves and Mark J. Kushner, Co-chairs 0910 ARPA Objectives Bert Hui, Defense Advanced Research Projects Agency Session I: Industrial Perspectives A. Equipment Supplier Perspectives 0925 Modeling: A Design Engine For The U.S. Semiconductor Equipment Industry Alexander M. Voshchenkov, Lain Research Corporation 1005 Challenges in Design and Manufacturing of Semiconductor Process Equipment Abe Ghanbari, Materials Research Corporation 1045 Break   B. Chip Manufacturer Perspectives 1100 Plasma Processes—A Chipmaker's View Frederick Dill, IBM T.J. Watson Research Center 1140 Digital Semiconductor's Perspective on Plasma Modeling and Database Needs Andrew Labun, Digital Equipment Corporation 1215 Lunch   Session II: Status And Needs Of Modeling And Simulation A. Tool Scale Simulation 1315 Glow Discharge Plasma Simulation: Current Status, Needs, and Future Outlook Demetre J. Economou, University of Houston 1345 Development of Design Oriented Simulation Tools for the Microelectronic Industry Anantha Krishnan, CFD Research Corporation B. Feature Scale Simulation 1415 Low Pressure Transport and Reaction in Features Timothy S. Cale, Arizona State University 1445 Feature Scale Simulation and Model Characterization Vivek Singh, Intel Corporation 1515 Break   Session III: Discussion 1530 Breakout Sessions Industrial Perspectives Tool Scale Feature Scale   1630 Break   1645 Reports on Breakout Sessions   1645 Industrial Perspectives Andrew Labun

OCR for page 61
--> 1705 Tool Scale Demetre Economou 1725 Feature Scale Vivek Singh 1745 Summary Discussion David Graves and Mark Kushner 1915 Dinner   Sunday, April, 2, 1995 Session IV: Database Needs 0900 Introductory Remarks David B. Graves and Mark J. Kushner, Co-chairs 0900 Database Needs: Electron Impact Processes Jean W. Gallagher, National Institute of Standards and Technology 0930 Rate Constants of Heterogeneous Processes in Plasma-Assisted Processing Gottlieb S. Oehrlein, SUNY Albany 1000 Status of Ion and Neutral Chemistry Databases Mark J. Kushner, University of Illinois at Urbana-Champaign 1030 Break   1045 Thermodynamic and Excited State Data for Plasma Processing Arthur V. Phelps, JILA 1115 Data Needs for Radiative Processes and Diagnostics Alan Garscadden, Air Force Wright Laboratory 1145 Critical Evaluation and Dissemination of Plasma Databases W. Lowell Morgan, Kinema Research and Software 1215 Lunch   Session V: Discussion 1315 Breakout Sessions Electron Impact Processes Heterogeneous Processes Ion Impact Processes and Neutral Chemistry Thermochemistry of Reactive Species Radiative Processes and Diagnostics   1445 Break   1500 Reports on Breakout Sessions   1500 Electron Impact Processes Jean Gallagher 1520 Heterogeneous Processes Gottlieb Oehrlein 1540 Ion Impact Processes and Neutral Chemistry Mark Kushner 1600 Thermochemistry of Reactive Species Arthur Phelps 1620 Radiative Processes and Diagnostics Alan Garscadden 1640 Summary Discussion David Graves and Mark Kushner 1800 Adjourn