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Massive Data Sets: Proceedings of a Workshop (1997)
Commission on Physical Sciences, Mathematics, and Applications (CPSMA)

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3 Data Overview

Data taken during manufacturing is available from a variety of sources. Some of the data are collected as a normal part of the statistical process control effort. Some of the data are collected as a normal part of the electrical screening tests that ensure product quality. At AMD we currently collect and summarize approximately 2 gigabytes of such data per day. In order to discover better ways of controlling key process steps, a number of companies are now automatically collecting some data using process state sensors.

Even in the development stage, the data volume from these sensors is huge. It is now possible to collect over 1 megabyte of sensor data per wafer in a plasma etch step alone. Given that there are typically 10 or more such steps in a manufacturing process, when one considers that an average wafer fabrication site produces several thousand wafers per week, the potential data volume for analysis is huge.

Some of the reasons we wish to collect manufacturing data and perform the analyses include: process and product characterization process optimization yield optimization process control design for manufacturing

The question might be raised as to how these needs are different from the same needs in a more typical manufacturing environment? The first and foremost reason is that data are available from a large number of process operations—and much of that data can be collected automatically. The second reason is that the manufacturing process involves a large number of steps, some of which are essentially single wafer steps and others of which are batch processing steps of various batch sizes.

In addition, much of the summary data collected at this time are highly correlated due to the nature of the underlying physics and chemistry of the processing operations. In addition there is an established practice of taking multiple measures of the same electrical characteristics using test cells of varying sizes and properties. So, many of the apparently "independent" observations aren't actually independent.

There are other sources of data that are less related to direct manufacturing that may be used with the manufacturing data. These sources of data involve the output of process simulators and die design simulators. It is becoming more standard throughout the semiconductor industry to link these simulators together in chains to get a better picture of the expected performance characteristics of processes and semiconductor devices. these expectations may then be compared to actual manufacturing experience.

Manufacturing process data are typically collected in 4 different stages, each of which provides a characteristic type of data for analysis. These data types are: die fabrication data wafer electrical data sort electrical data final test data

4 Die Fabrication Data

Die fabrication data are typically in-process SPC data at this time. Although SPC data and its uses in the manufacturing environment are fairly well understood, there has been some interest expressed both within AMD and in other companies about further leveraging the

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FRONT MATTER (R1-R10)
Opening Remarks (1-2)
PART I Participant's Expectations for the Workshop (3-12)
PART II Applications Papers (13-14)
Earth Observation Systems: What Shall We Do with the Data we Are Expecting in 1998? (15-22)
Information Retrieval: Finding Needles in Massive Haystacks (23-32)
Statistics and Massive Data Sets: one View from the Social Sciences (33-38)
The Challenge of Functional Magnetic Resonance Imaging (39-46)
Marketing (47-50)
Massive Data Sets: Guidelines and Practical Experience from Health Care (51-68)
Massive Data Sets in Semiconductor Manufacturing (69-76)
Management Issues in the Analysis of Large-Scale Crime Data Sets (77-80)
Analyzing Telephone Network Data (81-92)
Massive Data Assimilation/Fusion in Atmospheric Models and Analysis: Statistical, Physical, and Computational Challenges (93-103)
PART III Additional Invited Papers (103-104)
Massive Data Sets and Artificial Intelligence Planning (105-114)
Massive Data Sets: Problems and Possiblities, with Application to Environmental Monitoring (115-120)
Visualizing Large Datasets (121-128)
From Massive Data Sets to Science Catalogs: Applications and Challenges (129-142)
Information Retrieval and the Statistics of Large Data Sets (143-148)
Some Ideas About the Exploratory Spatial Analysis of Large Data Sets (149-156)
Massive Data Sets in Navy Problems (157-168)
Massive Data Sets Workshop: The Morning After (169-184)
PART IV Fundamental Issues and Grand Challenges (185-186)
Panel Discussion (187-202)
Items for Ongoing Consideration (203-204)
Closing Remarks (205-206)
Appendix: Workshop Participants (207-208)