energy migration in polymers has been demonstrated over dimensions approaching one-tenth of a micron. In chemically amplified resists, diffusion of the photogenerated catalysts may contribute to blurring. Fundamental studies of these and other aspects of resist materials are essential to the continued evolution of integrated circuit dimensions and the computing power gain that flows therefrom. An area of special opportunity is basic studies of the phenomena that underlie resist function. Opportunities lie in studies of diffusion, energy transfer, dissolution kinetics, photochemistry, and other processes that are responsible for resist function.

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