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RADIATIVE PROCESSES AND DIAGNOSTICS 30 15. J.M. Brown and M.R. Purnell, "Spectroscopic Parameters for Triatomic Free Radicals and Ions," in Molecular Spectroscopy: Modern Research, vol. III, ed. K.N. Rao (Academic Press, New York, 1985), pp. 249-296. 16. M.E. Jacox, "Vibrational and Electronic Energy Levels of Polyatomic Transient Molecules," J. Phys. Chem. Ref. Data, monograph 3 (1994). 17. M.E. Jacox, National Institute of Standards and Technology Atomic and Molecular Physics Database 26, NIST Vibrational and Electronic Energy Levels of Small Polyatomic Transient Molecules (VEEL version 4.0), available from Standard Reference Data, NIST, Bldg. 221/Room A320, Gaithersburg, MD 20899 (1995). 18. M.A.H. Smith, C.P. Rinsland, B. Fridovich, and K.N. Rao, "Intensities and Collision Broadening Parameters from Infrared Spectra," in Molecular Spectroscopy: Modern Research, vol. III, ed. K.N. Rao (Academic Press, New York, 1985), pp. 112-248. 19. L.S. Rothman, R.R. Gainache, R.H. Tipping, C.P. Rinsland, M.A.H. Smith, D.C. Benner, V. Malathy Devi, J.-M. Flaud, C. Camy-Peyret, A. Perrin, A. Goldman, S.T. Massie, L.R. Brown, and R.A. Toth, "The HITRAN Molecular Database: Editions of 1991 and 1992," J. Quant. Spectrosc. Radiat. Transf. 48:469 (1992). 20. S.T. Massie and A. Goldman, "Absorption Parameters of Very Dense Molecular Spectra for the HITRAN Compilation," J. Quant. Spectrosc. Radiat. Transf. 48:713 (1992). 21. S.E. Stein, National Institute of Standards and Technology Atomic and Molecular Physics Database 35, NIST/EPA Gas Phase Infrared Database , available from Standard Reference Data, NIST, Bldg. 22 I/Room A320, Gaithersburg, MD 20899 (April 1992). 22. C.J. Pouchert, ed., The Aldrich Library of FT-IR Spectra, edn. I, vol. 3, "Vapor Phase" (Aldrich Chemical Company, Inc., Milwaukee, Wisc., 1989); W.A Warr, "Spectral Databases," Chemometrics and Intelligent Laboratory Systems 10:279 (1991). 23. D.S. Early and B.H. Blake, Infrared Spectra of Gases and Vapors (The Dow Chemical Company, Midland, Mich., March 1965); R.H. Pierson, A.N. Fletcher, and E.S. Gantz, "Catalog of Infrared Spectra for Qualitative Analysis of Gases," Anal. Chem. 28:1218 (1956). 24. H. Okabe, Photochemistry of Small Molecules (Wiley, New York, 1978). 25. H. Kanamori, Y. Endo, and E. Hirota, "Infrared Diode Laser and Microwave Kinetic Spectroscopy," in Dynamics of Excited Molecules, ed. K. Kuchitsu (Elsevier, New York, 1994); E. Hirota, High-Resolution Spectroscopy of Transient Molecules (Springer-Verlag, New York, 1985); E. Hirota and K. Kawaguchi, "High Resolution Infrared Studies of Molecular Dynamics," Ann. Rev. Phys. Chem. 36:53-76 (1985). 26. R.S. McDowell, "Infrared Laser Spectroscopy, 1980-1983," Proc. SPIE 380:494 (1983); R.S. Eng and R.T. Ku, "High Resolution Linear Laser Absorption SpectroscopyâReview," Spec. Lett. 15:803 (1982). 27. T. Shimanouchi, Tables of Molecular Vibrational Frequencies, NSRDS-NBS monograph 39 (Washington, D.C., 1972); T. Shimanouchi, "Tables of Molecular Vibrational Frequencies. Consolidated Volume II," J. Phys. Chem. Ref. Data 6:993 (1977); L.M. Sverdlov, M.A. Kovner, and E.P. Krainov, Vibrational Spectra of Polyatomic Molecules (Halstead Press, New York, 1974). 28. M.W. Chase, Jr., C.A. Davies, J.R. Downey, Jr., D.J. Frurip, R.A. McDonald, and A.N. Syverud, JANAF Thermochemical Tables, 3rd edn., J. Phys. Chem. Ref. Data, suppl. 1 (1985). 29. J. Wormhoudt, A.C. Stanton, and J. Silver, "Spectroscopic Techniques for Characterization of Gas Phase Species in Plasma Etching and Vapor Deposition Processes," Proc. SPIE 452:88 (1983). 30. H. Schlossberg, "Fluorine-Atom Probe Techniques for Chemical Lasers," J. Appl. Phys. 47:2044 (1976); A.C. Stanton and C.E. Kolb, "Direct Absorption Measurement of the Spin-Orbit Splitting and 2p1/2 Radiative Lifetime in Atomic Fluorine (2p5)," J. Chem. Phys. 72:6637 (1980); A.C. Stanton, "A Measurement of the Radiative Lifetime of Cl (3p5 2p1/2)," Chem. Phys. Lett. 122:385 (1985); J. Wormhoudt, A.C. Stanton, A.D. Richards, and H.H. Sawin, "Atomic Chlorine Concentration and Gas Temperature Measurements in a Plasma Etching Reactor," J. Appl. Phys. 61:142 (1987); J. Wormhoudt, "Radical and Molecular Product Concentration Measurements in CF4 and CH4 Radio Frequency Plasmas by Infrared Diode Laser Absorption,'' J. Vac. Sci. Technol. A 8:1722 (1990); J. Wormhoudt, K.E. McCurdy, and J.B. Burkholder, ''Measurements of the Strengths of Infrared Bands of CF2," Chem. Phys. Lett. 158:480 (1989); J.J. Orlando and D.R. Smith, "Time-Resolved Tunable Diode Laser Detection of Products of the Infrared Multiphoton Dissociation of Hexafluoroacetone: A Line-Strength and Band-Strength Measurement for CF3," J. Phys. Chem. 92:5147 (1988); P.B. Davies, W. Lewis-Bevan, and D.K. Russell, "Infrared Diode Laser Spectrum of the v1 Band of CF2," J. Chem. Phys. 75:5602 (1981); C. Yamada and E. Hirota, "Infrared Diode Laser Spectroscopy of the CF3 v3 Band," J. Chem. Phys.
RADIATIVE PROCESSES AND DIAGNOSTICS 31 78:1703 (1983); K. Takahashi, M. Hori, K. Maruyama, S. Kishimoto, and T. Goto, "Measurements of the CF, CF2 and CF3 Radicals in a CHF3 Electron Cyclotron Resonance Plasma," Jpn. J. Appl. Phys. 32, L394 (1993); K. Maruyama, A. Sakai, and T. Goto, "Measurements of the CF3 Radical Using Infrared Diode Laser Absorption Spectroscopy," J. Phys. D: Appl. Phys. 26:199 (1993); K. Maruyama and T. Goto, ''Variation of CF3, CF2 and CF Radical Densities with RF CHF3 Discharge Duration," J. Phys. D: Appl. Phys. 28:884 (1995). 31. L.G. Piper and G.E. Caledonia, "Kinetics of Silane Decomposition by Atomic and Molecular Nitrogen Metastables," J. Phys. Chem. 95:698 (1991). 32. R.L. Farrow and D.J. Rakestraw, "Detection of Trace Molecular Species Using Degenerate Four-Wave Mixing," Science 257:1894 (1992); S. Williams, D.S. Green, S. Sethuraman, and R.N. Zare, "Detection of Trace Species in Hostile Environments Using Degenerate Four-Wave Mixing: CH in an Atmospheric-Pressure Flame," J. Am. Chem. Soc. 114:9122 (1992); G.J. Germann, A. McIlroy, T. Dreier, R.L. Farrow, and D.J. Rakestraw, "Detection of Polyatomic Molecules Using Infrared Degenerate Four-Wave Mixing,'' Ber. Bunsenges. Phys. Chem. 97:1630 (1993); T.J. Butenhoff and E.A. Rohlfing, "Resonant Four-Wave Mixing Spectroscopy of Transient Molecules in Free Jets," J. Chem. Phys. 97:1595 (1992). 33. S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood, eds., Handbook of Plasma Processing Fundamentals, Etching, Deposition, and Surface Interactions (Noyes Publications, Park Ridge, N.J., 1990); D.M. Manos and D.L. Flamm, eds., Plasma Etching: An Introduction (Academic Press, Boston, 1989); G.E. McGuire, ed., Semiconductor Materials and Process Technology Handbook (Noyes Publications, Park Ridge, N.J., 1988); T. Vicsek, Fractal Growth Phenomena (World Scientific, River Edge, New Jersey, 1992); C.R.M. Grovenor, Microelectronic Materials (A. Hilger, Philadelphia, 1989); A. Zangwill, Physics at Surfaces (Cambridge University Press, Cambridge, 1988). 34. Y.J. Chabal, "Surface Infrared Spectroscopy," Surface Science Reports 8:211 (1988); E.S. Aydil, R.A. Gottscho, and Y.J. Chabal, "Real- Time Monitoring of Surface Chemistry During Plasma Processing," Pure Appl. Chem. 66:1381 (1994); G.M.W. Kroesen and F.J. de Hoog, "In-Situ Diagnostics for Plasma Surface Processing," Appl. Phys. A 56:479 (1993); P. Hollins, "Surface Infrared Spectroscopy," Vacuum 45:705 (1994); P. Jakob and Y.J. Chabal, "Chemical Etching of Vicinal Si(111): Dependence of the Surface Structure and the Hydrogen Termination on the pH of the Etching Solutions," J. Chem. Phys. 95:2897 (1991); P. Jakob, Y.J. Chabal, K. Raghavachari, P. Dumas, and S.B. Christman, "Imperfections on the Chemically Prepared, Ideally H-Terminated Si(111)-(lÃl) Surfaces," Surface Science 285:251 (1993); Z.-H. Zhou, E.S. Aydil, R.A. Gottscho, Y.J. Chabal, and R. Reif, "Real-Time, In Situ Monitoring of Room-Temperature Silicon Surface Cleaning Using Hydrogen and Ammonia Plasmas," J. Electrochem. Soc. 140:3316 (1993); K.B. Koller, W.A. Schmidt, and J.E. Butler, "In Situ Infrared Reflection Absorption Spectroscopic Characterization of Plasma Enhanced Chemical Vapor Deposited SiO2 Films," J. Appl. Phys. 64:4704 (1988); M. McGonigal, V.M. Bermudez, and J.E. Butler, "Infrared Reflection Absorption Spectroscopy Study of the Chemisorption of Small Molecules (H2, O2 and H2O) on Silicon," J. Electron Spectrosc. Relat. Phenom. 54/55:1033 (1990); P. Spiberg, R.L. Woodin, J.E. Butler, and L. Dhar, "In Situ Fourier Transform IR Emission Spectroscopy of Diamond Chemical Vapor Deposition," Diamond and Related Materials 2:708 (1993). 35. p. Ho, W.G. Breiland, and R.J. Buss, "Laser Studies of the Reactivity of SiH with the Surface of a Depositing Film," J. Chem. Phys. 91:2627 (1989). 36. K. Tachibana, T. Shirafuji, Y. Hiyashi, and S. Maekawa, "In-Situ Ellipsometric Monitoring of the Growth of Polycrystalline Si Thin Films by RF Plasma Chemical Vapor Deposition," Jpn. J. Appl. Phys. 33:4191 (1994). 37. C.C. Cheng, K.V. Guinn, V.M. Donnelly, and I.P. Herman, "In-Situ Pulsed, Laser-Induced Thermal Desorption Studies of the Silicon Chloride Layer During Silicon Etching in High Density Plasmas of Cl2 and Cl2/O2 Mixtures," J. Vac. Sci. Technol. A 12:2630 (1994).
RADIATIVE PROCESSES AND DIAGNOSTICS 32
