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3 Nanoelectronics
Pages 43-62

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From page 43...
... and STARnet, which are private-public partnerships funding university semiconductor research; and (3) new device concepts enabled by two-dimensional (2D)
From page 44...
... . SOURCE: Tom Theis, Semiconductor Research Corporation, presentation to the workshop; from H
From page 45...
... Theis observed that clock speed and power stopped improving because the FET reached its voltage scaling limit. An external voltage applied to a currentgating electrode has to have a certain voltage swing to turn the current on and off.
From page 46...
... Researchers are now exploring such vertical tunneling structures fabricated from 2D crystals. Theis described a new steep slope device designed to operate at a lower voltage and dissipate significantly less power by utilizing graphene p-n junctions to filter the energy distribution of carriers to get beyond supply voltage limits of FETs.
From page 47...
... Theis then highlighted a specific device concept based on voltage-control of spin polarization -- the magnetoelectric tunnel junction, which has potential applications in both memory and logic, is nonvolatile, and should operate at ultralow power. Theis suggested that further developments in spin logic were likely to broaden the range of potential applications.
From page 48...
... The United States must take care not to lose its competitive edge in post-FET device research because new device concepts, yet to be fully explored, might exceed the performance of current devices, Theis suggested. NANO REGIME: CONTINUED CMOS SCALING THROUGH EXPLORATORY MATERIALS RESEARCH Todd Younkin, Senior Staff Research Scientist and STARnet Program Manager, Intel Corporation Todd Younkin noted that his presentation would be complementary to Tom Theis's talk in covering the spectrum of top-down and bottom-up approaches.
From page 49...
... For example, instead of using chemical vapor deposition or atomic-layer deposition for spacer-based double patterning, Intel now uses spacer-assisted quadruple patterning,2 which may get the industry down to only a few nanometers. Younkin explained that 1D lithography is used to make the fin, gate metal, or contact layers, called gratings, and these gratings are subsequently chopped into "plugs" or "cuts." At this point, the contacts must be aligned to subsequent features, which often requires multiple patterning steps; this means it can take six to eight masks to create one subset of the ultimate pattern.
From page 50...
... gapfill. These overarching themes include opportunities for novel patterning materials, such as EUVL, novel materials for atomic-layer deposition, and dielectric thin films by design.
From page 51...
... Total reflection X-ray fluorescence revealed that it is possible to deposit metal-onmetal at reasonable growth rates and discriminate against the nearby dielectric with the required level of perfection. Younkin observed that active research on integrated defect density assessments will continue into the future.
From page 52...
... Wadley continued, and Younkin agreed, that HEAs might also be worth future study and investment. Tom Theis added that the Semiconductor Research Corporation has an active synthetic biology program that uses deoxyribonucleic acid self-assembly to build three-dimensional (3D)
From page 53...
... It has never been tested or validated by the original tool author and it no longer advances science, since new versions are already available in the closed space of the original researcher. Such an approach cannot deliver authentic access to real research be scaled to larger communities because it renders deep research impossible, lending a bad reputation to the notion of gateways.
From page 54...
... . Although the MOSFET front on nanoHUB cannot simulate everything that PADRE can, it is more usable because it does not require the user to know a particular input parameter description language.
From page 55...
... The same NEMO simulation software powers eight nanoHUB tools, delivering results completely transparently to users without demanding computational science details. NEMO can tackle problems on the United States' largest supercomputers within 1 hour -- this would take 25 years to compute on a single desktop computer.
From page 56...
... SELF-ASSEMBLED NANOCOMPOSITES FOR MULTIFUNCTIONALITIES: CURRENT AND FUTURE Haiyan Wang, Professor, Purdue University (Formerly at Texas A&M University) Haiyan Wang noted that both Tom Theis's and Todd Younkin's presentations provided a helpful introduction for her discussion of self-assembled nanocompos ite structures for mutlifunctionalities.
From page 57...
... Epitaxial growth is also possible in the VAN microstructure, where both the ferromagnetic and antiferromagnetic materials can be grown on strontium titanium oxide single crystalline substrates. Strain coupling is also evident in the VAN microstructure, Wang continued.
From page 58...
... Joan Marie Redwing, Professor of Materials Science    and Engineering and Chemical Engineering and Electrical    Engineering and Associate Director, Materials Research    Institute, The Pennsylvania State University Moderator: Robert Pohanka, Director (Retired) , National    Nanotechnology Coordination Office Innovation Curt Richter opened the panel discussion asserting that electronics will con tinue to evolve only if innovation continues.
From page 59...
... Joan Marie Redwing reviewed the central themes from Tom Theis, Todd Younkin, Gerhard Klimeck, and Haiyan Wang. During her summaries of the talks, Redwing asked Younkin if Intel is interested in other materials, such as III-Vs, transition metal dichalcogenides (TMDs)
From page 60...
... Hardware and Materials Suppliers Todd Younkin asked what roles the hardware and materials suppliers should have with the end users, fabrication companies, and university research centers contributing to this community. He also asked how outsiders can be educated on the importance of the materials community.
From page 61...
... Gerhard Klimeck added that unreliability is also an issue for computational studies, as the provision of reliable material and toolboxes is generally not supported. Colombo noted that material variability must be eliminated from device development.
From page 62...
... The process could improve if these groups could prioritize their critical needs and develop relevant teams. Younkin advised that researchers consider the IMEC research electronics initiative in Belgium as a good example of collaboration among industry, academia, and government.


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