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Database Needs for Modeling and Simulation of Plasma Processing (1996)

Chapter: Appendix B: Workshop Agenda

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Suggested Citation:"Appendix B: Workshop Agenda." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.
Page 61
Suggested Citation:"Appendix B: Workshop Agenda." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.
Page 62

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Appendix B: Workshop Agenda SATURDAY, APRIL 1, 1995 0900 Opening Remarks David B. Graves and Mark J. Kushner, Co- chairs 0910 ARPA Objectives Bert Hui, Defense Advanced Research Projects Agency Session I: Industrial Perspectives A. Equipment Supplier Perspectives 0925 Modeling: A Design Engine for the U.S. Alexander M. Voshchenkov, Lam Research Semiconductor Equipment Industry Corporation 1005 Challenges in Design and Manufacturing of Abe Ghanbari, Materials Research Semiconductor Process Equipment Corporation 1045 Break B. Chip Manufacturer Perspectives 1100 Plasma Processes-A Chipmaker's View Frederick Dill, IBM T.J. Watson Research Center 1140 Digital Semiconductor's Perspective on Plasma Andrew Labun, Digital Equipment Modeling and Database Needs Corporation 1215 Lunch Session II: Status and Needs of Modeling and Simulation A. Tool Scale Simulation 1315 Glow Discharge Plasma Simulation: Current Demetre J. Economou, University of Houston Status, Needs, and Future Outlook 1345 Development of Design Oriented Simulation Tools Anantha Krishnan, CFD Research for the Microelectronic Industry Corporation B. Feature Scale Simulation 1415 Low Pressure Transport and Reaction in Features Timothy S. Cale, Arizona State University 1445 Feature Scale Simulation and Model Vivek Singh, Intel Corporation Characterization 1515 Break Session ID: Discussion 1530 Breakout Sessions Industrial Perspectives Tool Scale Feature Scale 1630 Break 1645 Reports on Breakout Sessions 1645 Industrial Perspectives Andrew Labun 61

1705 Tool Scale Demetre Economou 1725 Feature Scale Vivek Singh 1745 Summary Discussion David Graves and Mark Kushner 1915 Dinner SUNDAY, APRIL 2, 1995 Session IV: Database Needs 0900 Introductory Remarks David B. Graves and Mark J. Kuslmer, Co- chairs 0900 Database Needs: Electron Impact Processes Jean W. Gallagher, National Institute of Standards and Teclmology 0930 Rate Constants of Heterogeneous Processes in Gottlieb S. Oehrlein, SUNY Albany Plasma-Assisted Processing 1000 Status of Ion and Neutral Chemistry Databases Mark J. Kuslmer, University of Illinois at Urbana-Champaign 1030 Break 1045 Thermodynamic and Excited State Data for Arthur V. Phelps, JILA Plasma Processing 1115 Data Needs for Radiative Processes and Alan Garscadden, Air Force Wright Diagnostics Laboratory 1145 Critical Evaluation and Dissemination of Plasma W. Lowell Morgan, Kinema Research and Databases Software 1215 Lunch Session V: Discussion 1315 Breakout Sessions Electron Impact Processes Heterogeneous Processes Ion Impact Processes and Neutral Chemistry Thermochemistry of Reactive Species Radiative Processes and Diagnostics 1445 Break 1500 Reports on Breakout Sessions 1500 Electron Impact Processes Jean Gallagher 1520 Heterogeneous Processes Gottlieb Oehrlein 1540 Ion Impact Processes and Neutral Chemistry Mark Kushner 1600 Thermochemistry of Reactive Species Arthur Phelps 1620 Radiative Processes and Diagnostics Alan Garscadden 1640 Summary Discussion David Graves and Mark Kushner 1800 Adjourn 62

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In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable.

Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

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