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Database Needs for Modeling and Simulation of Plasma Processing (1996)

Chapter: Appendix C: Workshop Participants

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Suggested Citation:"Appendix C: Workshop Participants." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.
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Page 63
Suggested Citation:"Appendix C: Workshop Participants." National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. doi: 10.17226/5434.
×
Page 64

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Appendix C: Workshop Participants WahabAli AWA Associates Harold M. Anderson University of New Mexico Kaihan A. Ashtiani Materials Research Corporation Bray S. Aydil University of California at Santa Barbara James Babb Harvard-Smithsonian Center for Astrophysics Andrew D. Bailey III Plasma and Materials Technologies James N. Bardsley Lawrence Livermore National Laboratory Richard J. Buss Sandia National Laboratories Timothy S. Cale Arizona State University David C . Cartwright Los Alamos National Laboratory Charles Cerjan Lawrence Livermore National Laboratory Malcolm W. Chase National Institute of Standards and Technology Loucas G. Christophorou National Institute of Standards and Technology JoelM. Cook Lam Research Corporation Frederick Dill IBM T.J. Watson Research Center Vince Donnelly AT&T Bell Laboratories Demetre J. Economou University of Houston Erik Egan Motorola Douglas Ernie University of Minnesota Sychi Fang Intel Corporation David Fraser Intel Corporation Jean W. Gallagher National Institute of Standards and Technology Alan Garscadden Wright Laboratory Abe Ghanbari Materials Research Corporation Konstantinos P. Giapis California Institute of Technology Larry Goldberg National Science Foundation Steven M. Gorbatkin Oak Ridge National Laboratory R.A. Gottscho AT&T Bell Laboratories David B. Graves University of California, Berkeley David S. Green National Institute of Standards and Technology Michael Hartig Motorola/Sematech Gerald Hays Sandia National Laboratories Irving P. Herman Columbia University Dennis Hewett Lawrence Livermore National Laboratory Pauline Ho Sandia National Laboratories Bert Hui Defense Advanced Research Projects Agency Ellis Hyman Science Applications International Corporation Mitio Inokuti Argonne National Laboratory Les Jerde Tegal Corporation Rainer Johnsen University of Pittsburgh Glenn Joyce Naval Research Laboratory Yong-Ki Kim National Institute of Standards and Technology Kate Kirby Harvard-Smithsonian Center for Astrophysics Anantha Krishnan CFD Research Corporation Mark J. Kushner University of Illinois at Urbana-Champaign 63

Andrew Labun Digital Equipment Corporation Martin Lampe Naval Research Laboratory Barton Lane Plasma Dynamics James E. Lawler University of Wisconsin Chun C. Lin University of Wisconsin Gary Mallard National Institute of Standards and Technology Vasilios Manousiouthakis University of California, Los Angeles Jim McVittie Stanford University Ellen Meeks Sandia National Laboratories Fred W. Meyer Oak Ridge National Laboratory M. Meyyappan Scientific Research Associates Michael Mocella Dupont Fluoroproducts W. Lowell Morgan Kinema Research and Software Gottlieb S. Oehrlein State University of New York at .Albany Arthur V. Phelps nLA, University of Colorado Joseph Proud GTE (retired) Thomas Rescigno Lawrence Livermore National Laboratory Charles Roberson Office of Naval Research Yosuke Sakai Hokkaido University Martin Sclunidt Institut fur Niedertemperatur-Plasmaphysik Greifswald Barry I. Schneider National Science Foundation Vikram Singh Lam Research Corporation Vivek Singh Intel Corporation Steve Slinker Naval Research Laboratory Santosh K. Srivastava Jet Propulsion Laboratory William Stwalley University of Connecticut M. Surendra IBM T.J. Watson Research Center Wing Tsang National Institute of Standards and Technology Anna Tsao Defense Advanced Research Projects Agency Vahid Vahedi Lawrence Livermore National Laboratory Richard J. Van Brunt National Institute of Standards and Technology .AlexanderM. Voshchenkov Lam Research Corporation James R. Whetstone National Institute of Standards and Technology Claude Woods University of Wisconsin Jody Wonnhoudt Aerodyne Research Michael Zachariah National Institute of Standards and Technology 64

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In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable.

Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

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